Tantalum materials and their properties

Tantalum is a rare metal with high melting point. Melting point 2996° C, density 16.68g/cm³, lattice type: body-centered cubic. Thermal conductivity (25°C) 54W/M·K. Linear expansion coefficient (0~100°C)6.5×10%. Tantalum is mainly used to make tantalum electrolytic capacitors. Tantalum alloys such as Ta-2.5W, Ta-10W and Ta-40Nb can withstand high temperature and mineral acid corrosion better than any other materials. They can be used as heat-resistant and high-strength materials for aircraft, missiles and rockets, as well as parts and components of control and regulating devices, etc. Tantalum can be used as supporting accessory, heat shield, heater and heat sink in high temperature vacuum furnace. Tantalum craft can be used in vacuum evaporation device. Tantalum also has excellent biocompatibility and stability with human tissues, and can not react to human tissues. It can be used as surgical materials such as bone plate screws and suture needles.

Capacitor grade tantalum wire
Capacitor grade tantalum wire is used to make anode leads of tantalum electrolytic capacitors. Its advantages are large dielectric constant of oxide film and high reliability. Compared with metallurgical grade tantalum wire, capacitor grade tantalum wire has higher chemical purity, better surface finish and better oxygen resistance brittleness. Capacitor grade tantalum wire is made of tantalum powder as raw material by powder metallurgy and then through rolling, drawing and other metal plastic processing means. The surface should be smooth, clean and free of grooves, burrs and other defects. The important properties of capacitor tantalum wire include tensile strength, straightness, chemical composition and leakage current. The diameter of capacitor grade tantalum wire is generally between 0.15mm and 1.0mm, and the tensile strength is generally between 400MPa and 1700 MPa.

Tantalum target material
Melting point 2996℃, density 16.68g/cm³, thermal conductivity (25° C):54(W/M.K), tantalum target is usually prepared by melting tantalum ingot processing or powder metallurgy processing method. Purity of tantalum target >99.95%, smooth surface, grain diameter < The grain texture is mainly of [111] type at 100μm.Because the button has high conductivity, high thermal stability and the blocking effect on foreign atoms, the button film is plated on the integrated circuit by means of base emission coating method, which can prevent the diffusion of copper to the matrix silicon barrier layer. As an electrode material and surface engineering material (BM), the button target material has been widely used in liquid crystal display (LCD) and coating industry such as heat resistance, corrosion resistance and high conductivity.

Tantalum alloy
In order to improve the metal properties, some refractory metals are added to tantalum to form tantalum-based alloys. Used to improve its corrosion resistance and maintain its high strength and excellent processing performance at high temperature. Including Ta-W series, Ta40Nb, Ta-8W-2Hf, Ta-111, Ta-222, tantalum chromium alloy, tantalum tungsten and hafnium alloy. Tantalum and hafnium alloy is used as a heat-resistant and high-strength material for rockets, missiles and jet engines. Tantalum and hafnium tungsten alloy has a melting point of 3080℃ and a density of 16.6g/cm³. It has high temperature toughness and impact resistance and can be used at high temperature of 2500℃.