Titanium Target
Overview of Titanium Target
Titanium targets are processed from high-purity titanium materials. It has a lustrous silver-white appearance, a melting point of 1660℃, a boiling point of 3287℃, and a density of 4.5g/cm3.The purity of titanium target materials is generally 4N5 to 5N (99.995% to 99.999%).
Titanium target materials are an important type of material, mainly used for manufacturing materials in high-tech fields such as semiconductors, optoelectronics and magnetic materials.
In the semiconductor industry, titanium targets can be used to manufacture electronic components, such as photodiodes, photodiode bodies, photoreceivers and transmitters, etc. In the field of optoelectronics, titanium targets can be used to manufacture optoelectronic devices, such as leds and solar cells, etc. In the field of magnetic materials, titanium targets can be used to manufacture hard disks and magnetic cards, etc.
In addition to the above applications, titanium targets are also widely used in high-temperature alloys, conductive materials, chemical catalysts and medical devices, etc.
These fields not only require high-strength and corrosion-resistant materials, but also stable chemical properties and biocompatibility.
Titanium target materials precisely meet these requirements and have become one of the important materials in these fields.
High-performance titanium sputtering targets are an important measure to achieve independent research and development of key materials in the electronic information manufacturing industry and promote the transformation and upgrading of the titanium industry towards high-end.
Titanium Target Production Flow
A. The process of target material preparation
The raw material of titanium target blocks, sponge titanium, needs to go through the following purification process:
Chlorination: Sponge titanium reacts with chlorine at high temperatures to form titanium tetrachloride.
Reduction: High-purity titanium is produced through reduction by magnesium or sodium.
Purification: Vacuum smelting or electron beam smelting technology is adopted to remove impurities and enhance the purity of titanium metal.
Vacuum melting: Titanium metal is melted in a high-temperature vacuum environment, effectively avoiding pores and oxide inclusions.
Electron beam smelting: Utilizing high-energy electron beams to further remove trace impurities and produce ultra-high-purity titanium targets.
B. Forming and Machining
Hot rolling and cold rolling are used to process titanium materials into the required size and shape.
The forging process enhances the mechanical strength and internal uniformity of the target material by improving the grain structure of the material.
Surface polishing ensures that the target material has a good surface finish and reduces unevenness during sputtering.
Surface treatment (such as removing oxide scale and fine grinding) can enhance the smooth release of sputtered particles, thereby improving the quality of the coating.
